The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Jul. 09, 2020
Jusung Engineering Co., Ltd., Gwangju-si, KR;
Woong Kyo Oh, Gwangju-si, KR;
Young Woon Kim, Gwangju-si, KR;
Kwang Su Yoo, Gwangju-si, KR;
Do Hyung Kim, Gwangju-si, KR;
Yun Gyu Ha, Gwangju-si, KR;
JUSUNG ENGINEERING CO., LTD., , KR;
Abstract
The present disclosure relates to a substrate processing apparatus capable of improving efficiency in a substrate processing process by adjusting a flow rate and residence time of gas and a plasma density according to process conditions. The substrate processing apparatus according to the embodiment of the present disclosure is advantageous in that it can enhance efficiency in the substrate processing process by decreasing the flow rate and increasing residence time of gas and the plasma density in the process of supplying the gas through the shape forming of the gas injection module including the first and second injection plates.