logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12080516 B1

PDFFull Text
Date of Patent:
Sep. 03, 2024

Filed:

Nov. 23, 2021

High density plasma enhanced process chamber

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Zheng John Ye, Santa Clara, CA (US);

Jianhua Zhou, Campbell, CA (US);

Shouqian Shao, Fremont, CA (US);

Suhail Anwar, Saratoga, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:

Patterson + Sheridan, LLP

Primary Examiner:

Katherine A Bareford

Assistant Examiner:

Christina D McClure

Int. Cl.
CPC ...
C23C 16/34 (2006.01); C23C 16/30 (2006.01); C23C 16/40 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32119 (2013.01); C23C 16/308 (2013.01); C23C 16/345 (2013.01); C23C 16/401 (2013.01); C23C 16/505 (2013.01); H01J 37/32532 (2013.01); H01J 2237/332 (2013.01);
Abstract

The present disclosure is directed to a showerhead for distributing plasma. The showerhead includes a perforated tile coupled to a support structure. A dielectric window is disposed over the perforated tile. An electrode is coupled to the dielectric window. An inductive coupler is disposed over the dielectric window. At least a portion of the inductive coupler is angled relative to at least a portion of the electrode.

Find Patent Forward Citations

Ye, Zheng. (2024). High density plasma enhanced process chamber (U.S. Patent No. 12080516). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12080516

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…