The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Oct. 10, 2023
Applicant:

Mi2-factory Gmbh, Jena, DE;

Inventors:

Florian Krippendorf, Jena, DE;

Constantin Csato, Stammbach, DE;

Assignee:

MI2-FACTORY GMBH, Jena, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/05 (2006.01); H01J 37/147 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/05 (2013.01); H01J 37/1472 (2013.01); H01J 37/317 (2013.01); H01J 37/3171 (2013.01); H01J 37/3172 (2013.01); H01J 2237/002 (2013.01); H01J 2237/047 (2013.01); H01J 2237/057 (2013.01); H01J 2237/31705 (2013.01); H01J 2237/3171 (2013.01);
Abstract

A method of monitoring compliance with filter specification during the implantation of ions into a substrate reading a signature of the filter and comparing the read signature with filter signatures stored in a database to identify properties of the filter including at least one of a maximum allowable temperature of the filter and a maximum allowable accumulated ion dose of the filter. The temperature and/or the accumulated ion dose of the filter is measured while ions are implanted into the substrate by an ion beam passing through the filter. The implantation is terminated when the measured temperature or accumulated ion dose of the filter reaches or exceeds the maximum allowable threshold.


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