The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
May. 24, 2023
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/50 (2017.01); G01S 17/10 (2020.01); G01S 17/89 (2020.01); G06T 7/521 (2017.01); G06V 40/16 (2022.01); H04N 23/56 (2023.01);
U.S. Cl.
CPC ...
G06T 7/521 (2017.01); G01S 17/10 (2013.01); G01S 17/89 (2013.01); G06V 40/161 (2022.01); H04N 23/56 (2023.01); G06T 2207/10028 (2013.01); G06T 2207/10048 (2013.01); G06T 2207/10152 (2013.01); G06T 2207/20104 (2013.01); G06T 2207/30201 (2013.01);
Abstract
In a method for time-of-flight (ToF) based measurement, a scene is illuminated using a ToF light source modulated at a first modulation frequency F. While the light is modulated using F, depths are measured to respective surface points within the scene, where the surface points are represented by a plurality of respective pixels. At least one statistical distribution parameter is computed for the depths. A second modulation frequency Fhigher than Fis determined based on the at least one statistical distribution parameter. The depths are then re-measured using Fto achieve a higher depth accuracy.