The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Jun. 02, 2021
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Toshihide Aoshima, Shizuoka, JP;
Kenta Yamazaki, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/029 (2006.01); G03F 7/031 (2006.01); G03F 7/032 (2006.01); G03F 7/037 (2006.01); G03F 7/038 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0042 (2013.01); G03F 7/0045 (2013.01); G03F 7/029 (2013.01); G03F 7/031 (2013.01); G03F 7/032 (2013.01); G03F 7/0387 (2013.01); G03F 7/11 (2013.01); G03F 7/2002 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01);
Abstract
There are provided a photosensitive resin composition containing at least one precursor selected from the group consisting of a polyimide precursor and a polybenzoxazole precursor, a compound having a sulfurous ester structure, and a photoradical polymerization initiator, and satisfies at least one of the following conditions 1, . . . , or 3; a pattern forming method using a photosensitive film formed from the photosensitive resin composition; a cured film formed from the photosensitive resin composition; a laminate including the cured film; and a device having the cured film or the laminate.