logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12078929 B1

PDFFull Text
Date of Patent:
Sep. 03, 2024

Filed:

Jun. 02, 2021

Photosensitive resin composition, pattern forming method, cured film, laminate, and device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Toshihide Aoshima, Shizuoka, JP;

Kenta Yamazaki, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

JCIPRNET

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/029 (2006.01); G03F 7/031 (2006.01); G03F 7/032 (2006.01); G03F 7/037 (2006.01); G03F 7/038 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0042 (2013.01); G03F 7/0045 (2013.01); G03F 7/029 (2013.01); G03F 7/031 (2013.01); G03F 7/032 (2013.01); G03F 7/0387 (2013.01); G03F 7/11 (2013.01); G03F 7/2002 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01);
Abstract

There are provided a photosensitive resin composition containing at least one precursor selected from the group consisting of a polyimide precursor and a polybenzoxazole precursor, a compound having a sulfurous ester structure, and a photoradical polymerization initiator, and satisfies at least one of the following conditions 1, . . . , or 3; a pattern forming method using a photosensitive film formed from the photosensitive resin composition; a cured film formed from the photosensitive resin composition; a laminate including the cured film; and a device having the cured film or the laminate.

Find Patent Forward Citations

Quick Actions:

Aoshima, Toshihide. (2024). Photosensitive resin composition, pattern forming method, cured film, laminate, and device (U.S. Patent No. 12078929). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12078929

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…