The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Apr. 09, 2021
Applicant:

Cognex Corporation, Natick, MA (US);

Inventors:

Hunmin Cho, Seoul, KR;

Jonggyu Im, Seoul, KR;

Jongkwan Park, Gyeonggi-do, KR;

Assignee:

COGNEX CORPORATION, Natick, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01); G06N 3/08 (2023.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G01N 21/8851 (2013.01); G06N 3/08 (2013.01); G06T 7/0004 (2013.01); G01N 2021/8887 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01);
Abstract

Disclosed is a defect inspection device. The defect inspection device may include a lighting system designed for transmitting a lighting pattern having different illuminances for each area on a surface of an inspection object; a photographing unit for obtaining an image data of the inspection object; one or more processors for processing the image data; and a memory for storing a deep learning-based model. In addition, the one or more processors are adapted to control, the lighting system to transmit a lighting pattern having a different illuminance for each area on a surface of an inspection object, input, an image data obtained by the photographing unit into the deep learning-based model, wherein the image data includes a rapid change of illuminance in at least a part of the object surface; and determine, a defect on a surface of the inspection object using the deep learning-based model.


Find Patent Forward Citations

Cho, Hunmin. (2024). Inspection method based on edge field and deep learning (U.S. Patent No. 12078599). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12078599

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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