The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

May. 09, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jonathan Frankel, Los Gatos, CA (US);

Colin C. Neikirk, Mountain View, CA (US);

Pravin K. Narwankar, Sunnyvale, CA (US);

Quoc Truong, San Ramon, CA (US);

Govindraj Desai, Karnataka, IN;

Sekar Krishnasamy, Bangalore, IN;

Shrikant Swaminathan, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B01F 27/051 (2022.01); B01F 27/07 (2022.01); B01F 27/072 (2022.01); B01F 27/112 (2022.01); B01F 27/70 (2022.01); B01J 19/00 (2006.01); B01J 19/18 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4417 (2013.01); B01F 27/051 (2022.01); B01F 27/0726 (2022.01); B01F 27/074 (2022.01); B01F 27/112 (2022.01); B01F 27/70 (2022.01); B01J 19/0066 (2013.01); B01J 19/18 (2013.01); C23C 16/45555 (2013.01);
Abstract

A reactor for coating particles includes a stationary vacuum chamber that has a lower portion that forms a half-cylinder and an upper portion and that holds a bed of particles to be coated, a vacuum port in the upper portion of the chamber, a paddle assembly, and a gas injection assembly that includes a vaporizer to convert a first liquid to a first reactant or precursor gas, a manifold to receive the first reactant or precursor gas from the vaporizer, and a plurality of channels leading from the manifold to a plurality of apertures located in the lower portion of the chamber.


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