The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Jul. 20, 2021
Applicant:
Quantum Micromaterials, Inc., Bellevue, WA (US);
Inventors:
Sung-Chan Jo, Seoul, KR;
Kyonghoon Lee, Redmond, WA (US);
John S. Althaus, Saline, MI (US);
Hyung Jin Park, Goyang-si, KR;
Assignee:
Quantum MicroMaterials, Inc., Bellevue, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 7/06 (2006.01); C23C 16/02 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C08J 7/06 (2013.01); C23C 16/02 (2013.01); C23C 16/56 (2013.01); C08J 2379/00 (2013.01);
Abstract
This application features a method of forming a polymer layer on the surface of a substrate using a self-initiating monomer. A polymer layer is formed by polymerization of a monomer on a metal layer to fill or cover defects of the metal layer. The metal layer the polymer layer may be used as an airtight material.