The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Dec. 22, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Peter J. Guercio, Queen Creek, AZ (US);

Paul Westphal, Scottsdale, AZ (US);

Kirk Allen Fisher, Tempe, AZ (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 32/318 (2017.01); C01B 32/336 (2017.01); C01B 32/372 (2017.01); C23C 16/02 (2006.01); C23C 16/32 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C01B 32/318 (2017.08); C01B 32/336 (2017.08); C01B 32/372 (2017.08); C23C 16/0227 (2013.01); C23C 16/325 (2013.01); C23C 16/4408 (2013.01); C01P 2002/60 (2013.01); C01P 2002/72 (2013.01); C01P 2004/03 (2013.01); C01P 2006/10 (2013.01); C01P 2006/16 (2013.01); C01P 2006/80 (2013.01);
Abstract

The present invention relates to a new process for manufacturing a silicon carbide (SiC) coated body by depositing SiC in a chemical vapor deposition method using dimethyldichlorosilane (DMS) as the silane source on a graphite substrate. A further aspect of the present invention relates to the new silicon carbide coated body, which can be obtained by the new process of the present invention, and to the use thereof for manufacturing articles for high temperature applications, susceptors and reactors, semiconductor materials, and wafer.


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