The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

Aug. 30, 2021
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Sangshin Lee, Yongin-si, KR;

Sanghoon Kim, Hwaseong-si, KR;

Seil Kim, Hwaseong-si, KR;

Hong-Kyun Ahn, Hwaseong-si, KR;

Jongsung Park, Hwaseong-si, KR;

Seungjin Lee, Suwon-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 71/16 (2023.01); C23C 14/04 (2006.01); H10K 59/12 (2023.01); H10K 71/00 (2023.01); H10K 71/10 (2023.01);
U.S. Cl.
CPC ...
H10K 71/166 (2023.02); C23C 14/042 (2013.01); H10K 59/12 (2023.02); H10K 71/00 (2023.02); H10K 71/164 (2023.02); H10K 71/191 (2023.02);
Abstract

A mask includes: a body portion including a cell area, and a peripheral area surrounding the cell area, the body portion having a plurality of cell openings defined therein; and a plurality of mark patterns at the peripheral area. The cell area includes: a first area; and a second area adjacent to the first area, and the plurality of cell openings includes: first cell openings defined at the first area, and spaced from each other; and second cell openings defined at the second area, and spaced from each other. Each of the mark patterns includes at least one recess portion, and has a point-symmetrical shape with respect to a corresponding symmetry point.


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