The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2024
Filed:
Sep. 19, 2022
Applicant:
Samsung Display Co., Ltd., Yongin-si, KR;
Inventors:
Young Rag Do, Seoul, KR;
Yeon Goog Sung, Goyang-si, KR;
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); B82Y 40/00 (2011.01); H01L 21/02 (2006.01); H01L 21/20 (2006.01); H01L 21/304 (2006.01); H01L 21/306 (2006.01); H01L 21/3063 (2006.01); H01L 21/762 (2006.01); H01L 29/06 (2006.01); H01L 29/41 (2006.01);
U.S. Cl.
CPC ...
H01L 33/005 (2013.01); B82Y 40/00 (2013.01); H01L 21/02 (2013.01); H01L 21/2007 (2013.01); H01L 21/304 (2013.01); H01L 21/306 (2013.01); H01L 21/3063 (2013.01); H01L 21/76251 (2013.01); H01L 29/06 (2013.01); H01L 29/0669 (2013.01); H01L 29/41 (2013.01); H01L 21/02543 (2013.01); H01L 21/0262 (2013.01);
Abstract
Provided is a method of manufacturing a nanorod. The method comprising comprises the steps of: providing a growth substrate and a support substrate; epitaxially growing a nanomaterial layer onto one surface of the growth substrate; forming a sacrificial layer on one surface of the support substrate; bonding the nanomaterial layer with the sacrificial layer; separating the growth substrate from the nanomaterial layer; flattening the nanomaterial layer; forming a nanorod by etching the nanomaterial layer; and separating the nanorod by removing the sacrificial layer.