The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

May. 05, 2022
Applicant:

Materion Corporation, Mayfield Heights, OH (US);

Inventors:

Ramesh Kothandapani, Singapore, SG;

Christopher Johnson, Mayfield Heights, OH (US);

ZhenWei Tee, Mayfield Heights, OH (US);

Noel De Leon, Mayfield Heights, OH (US);

SinLi Tan, Singapore, SG;

Assignee:

Materion Corporation, Mayfield Heights, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/495 (2006.01); H01L 21/48 (2006.01); H01L 23/373 (2006.01); H01L 23/66 (2006.01);
U.S. Cl.
CPC ...
H01L 23/49568 (2013.01); H01L 21/4828 (2013.01); H01L 21/4842 (2013.01); H01L 23/3732 (2013.01); H01L 23/49558 (2013.01); H01L 23/49562 (2013.01); H01L 23/49582 (2013.01); H01L 23/49586 (2013.01); H01L 23/66 (2013.01); H01L 2223/6616 (2013.01); H01L 2223/6683 (2013.01);
Abstract

A microelectronics package assembly and process of making same are disclosed. The flange has an upper surface and a first coating disposed on the upper surface of the flange. The insulator has a bottom surface for mounting onto the flange and an upper surface opposite the bottom surface. A second coating is disposed on the bottom surface of the insulator and a third coating disposed on the upper surface of the insulator. The first coating, the second coating, and the third coating each have a thickness of less than or equal to 1 micron. At least one of the first coating, the second coating, and the third coating is applied via at least one of physical vapor deposition, atomic deposition, or chemical deposition.


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