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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12074073 B1

PDFFull Text
Date of Patent:
Aug. 27, 2024

Filed:

May. 06, 2022

Prescriptive analytics in highly collinear response space

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sidharth Bhatia, Santa Cruz, CA (US);

Jie Feng, Milpitas, CA (US);

Dermot Cantwell, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Lowenstein Sandler LLP

Primary Examiner:

Tuan A Vu

Int. Cl.
CPC ...
G05B 13/04 (2006.01); G06N 3/08 (2023.01); G06Q 50/04 (2012.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); G01B 7/06 (2006.01); G01N 21/41 (2006.01); G06T 7/00 (2017.01); G11C 11/16 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 22/12 (2013.01); G06N 3/08 (2013.01); G06Q 50/04 (2013.01); H01L 21/02 (2013.01); H01L 21/67253 (2013.01); G01B 7/105 (2013.01); G01N 21/41 (2013.01); G06T 7/0004 (2013.01); G11C 11/1675 (2013.01); H01J 37/32458 (2013.01); Y02P 90/30 (2015.11);
Abstract

A method includes: receiving film property data associated with manufacturing parameters of manufacturing equipment; determining that the film property data is correlated and is different from target data; selecting, by a processing device, a set of data points of the film property data that are orthogonal to the target data; performing, by the processing device, feature extraction on the set of data points; and determining, based on the feature extraction, updates to one or more of the manufacturing parameters to meet the target data.

Find Patent Forward Citations

Bhatia, Sidharth. (2024). Prescriptive analytics in highly collinear response space (U.S. Patent No. 12074073). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12074073

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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