The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

Sep. 25, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Douglas Brian Baumgarten, Round Rock, TX (US);

Russell Kaplan, Sunnyvale, CA (US);

Amitabh Puri, San Jose, CA (US);

Paul B. Reuter, Austin, TX (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67389 (2013.01); C23C 16/54 (2013.01); H01L 21/67242 (2013.01); H01L 21/67772 (2013.01); C23C 16/4408 (2013.01); C23C 16/45563 (2013.01); C23C 16/458 (2013.01); C23C 16/52 (2013.01); H01L 21/67775 (2013.01); Y10T 137/0402 (2015.04);
Abstract

Disclosed are implementations for efficient purging of substrate carriers (and content held therein) and preventing external contaminants from entering a gas purge apparatus by coupling the gas purge apparatus to a substrate carrier, performing a first gas purging session of an environment of the substrate carrier, receiving a first signal of a first signal type, responsive to receiving the first signal, keeping the gas purge apparatus coupled to the substrate carrier, performing a second gas purging session of the environment of the substrate carrier, receiving a second signal of a second signal type, and, responsive to receiving the second signal, decoupling the purge apparatus from the substrate carrier.


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