The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

May. 12, 2022
Applicant:

Snap Inc., Santa Monica, CA (US);

Inventors:

Simon Saito Haagen Nielsen, Beverly Hills, CA (US);

John Christopher Collins, Mico, TX (US);

Allan Joseph Evans, Los Angeles, CA (US);

Graham Shaw, Redondo Beach, CA (US);

Vikas Gupta, San Francisco, CA (US);

Assignee:

Snap Inc., Santa Monica, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2022.01); B64C 39/02 (2023.01); G06T 3/4038 (2024.01); G06T 7/55 (2017.01); H04N 23/698 (2023.01); B64U 101/30 (2023.01);
U.S. Cl.
CPC ...
G06T 7/55 (2017.01); B64C 39/024 (2013.01); G06T 3/4038 (2013.01); H04N 23/698 (2023.01); B64U 2101/30 (2023.01); B64U 2201/104 (2023.01); G06T 2207/10028 (2013.01);
Abstract

A method and system for creating a point cloud are disclosed. A first image is captured by a first camera sensor and a second image is captured by a second camera sensor. The first and the second image have an area of overlap. Location of the first camera relative to the second camera is predetermined and each of the first and the second camera is having a field of view of more than 180 degrees. Based on the area of overlap, the first and the second image are stitched to create a composite stitched image. In one aspect, depth information from the area of overlap is extracted based on the predetermined location and a point cloud is created from otherwise to be discarded image data in the area of overlap.


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