The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

Jan. 30, 2023
Applicant:

Siemens Healthcare Gmbh, Erlangen, DE;

Inventor:

Michael Manhart, Fuerth, DE;

Assignee:

Siemens Healthineers AG, Forchheim, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 11/00 (2006.01); A61B 6/00 (2024.01); A61B 6/12 (2006.01); A61B 6/40 (2024.01); G06T 7/11 (2017.01); G06T 7/136 (2017.01);
U.S. Cl.
CPC ...
G06T 11/008 (2013.01); A61B 6/12 (2013.01); A61B 6/4021 (2013.01); A61B 6/488 (2013.01); A61B 6/5258 (2013.01); G06T 7/11 (2017.01); G06T 7/136 (2017.01); G06T 11/006 (2013.01); G06T 2200/04 (2013.01); G06T 2207/10116 (2013.01); G06T 2207/20021 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30004 (2013.01); G06T 2207/30241 (2013.01); G06T 2210/41 (2013.01); G06T 2211/421 (2013.01);
Abstract

A computer-implemented method comprises: providing at least two exploratory views; segmenting a first object in the at least two exploratory views to determine first two-dimensional object masks; segmenting the second object in the at least two exploratory views tow determine second two-dimensional object masks; determining a first three-dimensional object mask as a function of the first two-dimensional object masks; determining a second three-dimensional object mask as a function of the second two-dimensional object masks; and determining an overlap of the first object and the second object for at least one capture trajectory as a function of the first three-dimensional object mask and the second three-dimensional object mask.


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