The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

Aug. 27, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventor:

Martin A. Hilkene, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01M 3/34 (2006.01); G05B 15/02 (2006.01); C30B 25/16 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
G01M 3/34 (2013.01); G05B 15/02 (2013.01); C30B 25/16 (2013.01); H01J 37/32972 (2013.01);
Abstract

A method and system for vacuum chamber integrity verification after chamber maintenance or venting. The method includes a computing system causing a measurement cycle that includes causing a pump to pump down pressure of the vacuum chamber for a set duration of time or to a target pressure; causing an isolation valve to isolate the vacuum chamber; receiving sensor data from an optical emission sensor; and analyzing the sensor data to determine whether the sensor data satisfies one or more sensor data criteria. The method further includes, the computing system, causing one or more repetitions of the measurement cycle until the sensor data meets the one or more sensor data criteria. The method further includes analyzing the sensor data that meets the sensor data criteria to determine at least one of vacuum chamber leak rate or vacuum chamber moisture content. The system includes the vacuum chamber, pump, isolation valve, optical emission sensor, and computing system.


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