The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2024
Filed:
Jul. 26, 2019
Applicant:
Ams Ag, Premstätten, AT;
Inventors:
Gerhard Eilmsteiner, Eindhoven, NL;
Desislava Oppel, Eindhoven, NL;
Deborah Morecroft, Eindhoven, NL;
Jens Hofrichter, Eindhoven, NL;
Assignee:
AMS AG, Premstätten, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/04 (2006.01); G01J 3/02 (2006.01); G01J 3/12 (2006.01); G01J 3/51 (2006.01); G01T 1/20 (2006.01); G02B 5/28 (2006.01);
U.S. Cl.
CPC ...
G01J 1/0492 (2013.01); G01J 1/0474 (2013.01); G01J 1/0488 (2013.01); G01J 3/0205 (2013.01); G01J 3/51 (2013.01); G01T 1/2002 (2013.01); G01T 1/2008 (2013.01); G02B 5/28 (2013.01); G01J 2003/1226 (2013.01); G01J 2003/123 (2013.01); G01J 2003/1239 (2013.01); G02B 5/284 (2013.01); G02B 5/288 (2013.01);
Abstract
A filter assembly includes an incident medium, a spacer, at least one dielectric filter and an exit medium. The spacer is arranged between the incident medium and the at least one dielectric filter such that the incident medium and the at least one dielectric filter are spaced apart by a working distance and thereby enclose a medium of lower index of refraction than the incident medium. The at least one dielectric filter is arranged on the exit medium.