The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

Mar. 03, 2021
Applicant:

Basf SE, Ludwigshafen, DE;

Inventors:

Tobias Urban, Ludwigshafen, DE;

Paul Klingelhoefer, Ludwigshafen, DE;

Sophie Maitro-Vogel, Ludwigshafen, DE;

Yvonne Schriefers, Ludwigshafen, DE;

Frank Richter, Ludwigshafen, DE;

Manfred Bichler, Trostberg, DE;

Assignee:

BASF SE, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 3/02 (2006.01); C25D 3/38 (2006.01); C25D 5/00 (2006.01); C25D 21/12 (2006.01);
U.S. Cl.
CPC ...
C25D 21/12 (2013.01); C25D 3/38 (2013.01);
Abstract

The present invention relates to a process for depositing a metal layer on a substrate by contacting the substrate with a metal plating bath comprising a metal ion source and a suppressor, and applying a current density to the substrate, where the suppressor is a polycarboxylate ether as described below. The invention further relates to a metal plating bath comprising a metal ion source and the suppressor which is a polycarboxylate ether; and to a use of the polycarboxylate ether in a metal plating bath for depositing a metal layer on a substrate.


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