The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2024

Filed:

Jul. 11, 2023
Applicants:

Totalenergies Onetech, Courbevoie, FR;

Sulzer Management Ag, Winterthur, CH;

Inventors:

Romuald Coupan, Vanves, FR;

Nikolai Nesterenko, Nivelles, BE;

Gleb Veryasov, Nivelles, BE;

Assignees:

TOTALENERGIES ONETECH, Courbevoie, FR;

SULZER MANAGEMENT AG, Winterthur, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07C 17/10 (2006.01); C01B 7/09 (2006.01); C01B 32/05 (2017.01); C07C 4/06 (2006.01); C25B 1/02 (2006.01); C25B 1/24 (2021.01);
U.S. Cl.
CPC ...
C07C 17/10 (2013.01); C01B 7/093 (2013.01); C01B 32/05 (2017.08); C07C 4/06 (2013.01); C25B 1/02 (2013.01); C25B 1/24 (2013.01); C07C 2529/04 (2013.01);
Abstract

The present disclosure relates in its first aspect to a process of converting a stream comprising methane into chemicals, said process being remarkable in that it comprises the steps of providing a first stream () comprising methane, providing a second stream () which is a bromine-rich stream, putting into contact said first stream () with said second stream () to obtain a third stream () comprising at least unreacted methane, methyl bromide, dibromomethane, and hydrogen bromide and removing said dibromomethane from said third stream (), to produce a dibromomethane stream () and a fourth stream () comprising unreacted methane, methyl bromide and hydrogen bromide; wherein the fourth stream () is converted into chemicals. In its second aspect, the present disclosure concerns an installation for carrying out the process of the first aspect.


Find Patent Forward Citations

Loading…