The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2024
Filed:
Nov. 10, 2022
Applicants:
Toyo Kohan Co., Ltd., Tokyo, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Inventors:
Assignees:
TOYO KOHAN CO., LTD., Tokyo, JP;
SUMITOMO ELECTRIC INDUSTRIES, LTD., Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 15/01 (2006.01); B23K 20/02 (2006.01); B32B 15/18 (2006.01); B32B 15/20 (2006.01); C22F 1/08 (2006.01); C30B 1/02 (2006.01); C30B 25/18 (2006.01); C30B 29/02 (2006.01); H10N 60/01 (2023.01);
U.S. Cl.
CPC ...
B32B 15/015 (2013.01); B23K 20/023 (2013.01); B32B 15/18 (2013.01); B32B 15/20 (2013.01); C22F 1/08 (2013.01); C30B 1/02 (2013.01); C30B 25/18 (2013.01); C30B 29/02 (2013.01); H10N 60/0576 (2023.02);
Abstract
It is an object to provide a substrate for epitaxial growth having a metal base material laminated with a copper layer. On a surface of the copper layer, an area occupied by crystal grains having crystal orientations other than a (200) plane present within 3 μm from the surface can be less than 1.5%. A surface roughness along a same direction as a rolling direction per unit length of 60 μm when measured by AFM can be Ra1<10 nm.