The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2024

Filed:

Jun. 19, 2021
Applicant:

Gmems Tech Shenzhen Limited, Shenzhen, CN;

Inventors:

Guanghua Wu, Dublin, CA (US);

Xingshuo Lan, San Jose, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H04R 31/00 (2006.01); B81B 7/02 (2006.01); B81C 1/00 (2006.01); H04R 19/04 (2006.01);
U.S. Cl.
CPC ...
H04R 31/00 (2013.01); B81B 7/02 (2013.01); B81C 1/00182 (2013.01); H04R 19/04 (2013.01); H04R 2201/003 (2013.01);
Abstract

The present invention provides a process for fabricating a capacitive microphone such as a MEMS microphone. In the microphone, a movable or deflectable membrane/diaphragm may be so fabricated that it moves in a lateral manner relative to a fixed backplate, instead of moving toward/from the fixed backplate. The fixed backplate may be so fabricated that it includes an electrical insulator sandwiched between two sub-conductors to cancel systematic/background noise. The squeeze film damping is substantially avoided, and the performance, such as signal to noise ratio, of the fabricated microphone is significantly improved.


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