The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2024
Filed:
May. 15, 2020
Universität Innsbruck, Innsbruck, AT;
Paul Scheier, Innsbruck, AT;
Felix Laimer, Innsbruck, AT;
Lorenz Kranabetter, Aarhus C, DK;
Fabio Zappa, Innsbruck, AT;
Michael Renzler, Innsbruck, AT;
Lukas Thiefenthaler, Innsbruck, AT;
Simon Albertini, Zurich, CH;
Paul Martini, Stockholm, SE;
Siegfried Kollotzek, Innsbruck, AT;
UNIVERSITÄT INNSBRUCK, Innsbruck, AT;
Abstract
Method for producing multiply-charged helium nanodroplets and charged dopant clusters and nanoparticles out of the helium nanodroplets, the method comprising: •producing neutral helium nanodroplets in a cold head () via expansion of a pressurized, pre-cooled, supersonic helium beam of high purity through a nozzle () into high vacuum with a base pressure under operation preferably below 20 mPa, •ionizing the helium nanodroplets by electron impact (), wherein the electron impact () leads to multiply-charged helium nanodroplets, •doping the charged helium nanodroplets with dopant vapor in the pickup cell (), wherein the doped nanodroplets form cluster ions with the initial charges acting as seeds, wherein the size of the nanoparticles can vary from a few atoms up to 105 atoms by arranging the size of the neutral helium nanodroplets, the charge of the helium nanodroplets and the density of dopant vapor in the pickup cell ().