The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2024

Filed:

Nov. 04, 2019
Applicant:

Koninklijke Philips N.v., Eindhoven, NL;

Inventor:

Christiaan Varekamp, Veldhoven, NL;

Assignee:

Koninklijke Philips N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 3/00 (2024.01); G06T 3/047 (2024.01); G06T 7/593 (2017.01);
U.S. Cl.
CPC ...
G06T 3/047 (2024.01); G06T 7/593 (2017.01); G06T 2207/20068 (2013.01); G06T 2207/20228 (2013.01);
Abstract

An apparatus where a vertical image position of the scene point may depend on the horizontal image position. A mapper generates a modified image having a modified projection by applying a mapping to the first wide angle image corresponding to a mapping from the first projection to a perspective projection followed by a non-linear vertical mapping from the perspective projection to a modified vertical projection of the modified projection and a non-linear horizontal mapping from the perspective projection to a modified horizontal projection of the modified projection. Then a disparity estimator generates disparities for the modified image relative to a second image and representing a different view point than the first wide angle image.


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