The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2024

Filed:

Jan. 28, 2020
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Choel-Min Jang, Gyeonggi-do, KR;

Jin-Kwang Kim, Gyeonggi-do, KR;

Sung-Chul Kim, Gyeonggi-do, KR;

Jae-Hyun Kim, Gyeonggi-do, KR;

Seung-Yong Song, Gyeonggi-do, KR;

Suk-Won Jung, Gyeonggi-do, KR;

Myung-Soo Huh, Gyeonggi-do, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/4402 (2013.01); C23C 16/45536 (2013.01); H01J 37/32357 (2013.01); H01J 37/32834 (2013.01);
Abstract

Provided is a vapor deposition apparatus including a first injection unit injecting a first raw gas in a first direction and a first filter unit mounted on the first injection unit. The first filter unit includes a plurality of plates separated from one another in the first direction and disposed in parallel to one another, each of the plurality of plates having holes therein, being detachably coupled with the first filter unit, and having the holes with sizes of horizontal cross-sections gradually increasing in a direction in which the first raw gas moves. Accordingly, a process efficiency of the vapor deposition apparatus may be enhanced.


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