The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2024
Filed:
Jul. 31, 2020
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Fei Li, Austin, TX (US);
Weijun Liu, Cedar Park, TX (US);
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/101 (2014.01); B41J 2/01 (2006.01); B41M 5/00 (2006.01); C09D 11/107 (2014.01); C09D 11/38 (2014.01);
U.S. Cl.
CPC ...
C09D 11/101 (2013.01); B41J 2/01 (2013.01); B41M 5/0023 (2013.01); C09D 11/107 (2013.01); C09D 11/38 (2013.01);
Abstract
A photocurable composition can comprise a polymerizable material and an initiator. The polymerizable material can include at least one first multi-functional monomer containing an allyloxymethyl methacrylate structure in an amount at least 5 wt % and not greater than 20 wt % based on the polymerizable material. The photocurable composition can be suitable for use in inkjet adaptive planarization and may be adapted to form cured layers having a glass transition temperature of at least 120° C.