The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2024
Filed:
Jun. 14, 2019
Wacker Chemie Ag, Munich, DE;
Karl-Heinz Rimböck, Heldenstein, DE;
Michael Müller, Burghausen, DE;
Natalia Sofina, Burghausen, DE;
Wacker Chemie AG, Munich, DE;
Abstract
A process for producing methylchlorosilanes of general formula 1, (CH)HSiCl, in which n represents values from 1 to 3 and m represents values of 0 or 1 in a fluidized bed reactor is provided. A chloromethane-containing reaction gas is reacted with a particulate contact mass containing silicon in the presence of copper catalyst. An operating granulation contains at least 1% by mass of silicon-containing particles S described by a structural parameter S. S has a value of at least 0 and is calculated according to equation (1), wherein φis symmetry-weighted sphericity factor, ρis poured density [g/cm], and ρis average particle solids density [g/cm].