The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2024
Filed:
Mar. 17, 2023
Applicant:
Kateeva, Inc., Newark, CA (US);
Inventors:
Justin Mauck, Belmont, CA (US);
Alexander Sou-Kang Ko, Santa Clara, CA (US);
Eliyahu Vronsky, Los Altos, CA (US);
Shandon Alderson, San Carlos, CA (US);
Alexey Stepanov, Sunnyvale, CA (US);
Assignee:
Kateeva, Inc., Newark, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/00 (2006.01); B05C 15/00 (2006.01); B05D 1/26 (2006.01); B41J 29/02 (2006.01); B41J 29/13 (2006.01); B41J 29/377 (2006.01); H10K 71/00 (2023.01); H10K 71/13 (2023.01);
U.S. Cl.
CPC ...
B41J 29/02 (2013.01); B05C 15/00 (2013.01); B05D 1/26 (2013.01); B05D 5/00 (2013.01); B41J 29/13 (2013.01); B41J 29/377 (2013.01); H10K 71/00 (2023.02); H10K 71/135 (2023.02); H10K 71/811 (2023.02);
Abstract
A method comprises processing a substrate in a gas enclosure to form a film on one or more portions of the substrate. The method further comprises, while processing the substrate, circulating gas along a circulation path through the gas enclosure. Circulating the gas may comprise flowing gas through an exhaust housing enclosing a printhead assembly housed in the gas enclosure and filtering the gas flowing downstream of the printhead assembly from the exhaust housing.