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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12064979 B1

PDFFull Text
Date of Patent:
Aug. 20, 2024

Filed:

Mar. 17, 2023

Low-particle gas enclosure systems and methods

Applicant:

Kateeva, Inc., Newark, CA (US);

Inventors:

Justin Mauck, Belmont, CA (US);

Alexander Sou-Kang Ko, Santa Clara, CA (US);

Eliyahu Vronsky, Los Altos, CA (US);

Shandon Alderson, San Carlos, CA (US);

Alexey Stepanov, Sunnyvale, CA (US);

Assignee:

Kateeva, Inc., Newark, CA (US);

Attorney:

Hauptman Ham, LLP

Primary Examiner:

Charles Capozzi

Int. Cl.
CPC ...
B05D 5/00 (2006.01); B05C 15/00 (2006.01); B05D 1/26 (2006.01); B41J 29/02 (2006.01); B41J 29/13 (2006.01); B41J 29/377 (2006.01); H10K 71/00 (2023.01); H10K 71/13 (2023.01);
U.S. Cl.
CPC ...
B41J 29/02 (2013.01); B05C 15/00 (2013.01); B05D 1/26 (2013.01); B05D 5/00 (2013.01); B41J 29/13 (2013.01); B41J 29/377 (2013.01); H10K 71/00 (2023.02); H10K 71/135 (2023.02); H10K 71/811 (2023.02);
Abstract

A method comprises processing a substrate in a gas enclosure to form a film on one or more portions of the substrate. The method further comprises, while processing the substrate, circulating gas along a circulation path through the gas enclosure. Circulating the gas may comprise flowing gas through an exhaust housing enclosing a printhead assembly housed in the gas enclosure and filtering the gas flowing downstream of the printhead assembly from the exhaust housing.

Find Patent Forward Citations

Mauck, Justin. (2024). Low-particle gas enclosure systems and methods (U.S. Patent No. 12064979). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12064979

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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