The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2024
Filed:
Apr. 30, 2021
Applicants:
Nutech Ventures, Lincoln, NE (US);
University of Connecticut, Farmington, CT (US);
Inventors:
Ruiguo Yang, Lincoln, NE (US);
Arian Jaberi, Lincoln, NE (US);
Amir Monemian Esfahani, Lincoln, NE (US);
Ali Tamayol, Providence, RI (US);
Assignees:
NUTECH VENTURES, Lincoln, NE (US);
UNIVERSITY OF CONNECTICUT, Farmington, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L 3/00 (2006.01); C12M 1/34 (2006.01); C12N 1/34 (2006.01);
U.S. Cl.
CPC ...
B01L 3/5025 (2013.01); C12M 41/46 (2013.01); C12N 1/34 (2013.01); B01L 2300/087 (2013.01); B01L 2300/0877 (2013.01); B01L 2300/0883 (2013.01); C12N 2513/00 (2013.01);
Abstract
Microfluidic gradient generators that can create robust platforms that can not only be used for creating co-cultures of cells with various ratios, but also can simultaneously generate gradients of mechanical and chemical stresses. A chip utilizes microchambers embedded within channels to provide space for 3D cell culture and exposes these cells to gradients of mechanical shear stress and a chemical treatment.