The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Jun. 10, 2021
Applicant:

SK Hynix Inc., Icheon-si Gyeonggi-do, KR;

Inventor:

Kang Sik Choi, Icheon-si Gyeonggi-do, KR;

Assignee:

SK hynix Inc., Icheon-si Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); H10B 41/10 (2023.01); H10B 41/27 (2023.01); H10B 43/10 (2023.01);
U.S. Cl.
CPC ...
H10B 41/27 (2023.02); H10B 41/10 (2023.02); H10B 43/10 (2023.02); H10B 43/27 (2023.02);
Abstract

A method of manufacturing a semiconductor device may include forming a stack with alternately stacked first material layers and second material layers, forming a first opening that passes through the stack, forming a blocking layer in the first opening, forming a data storage layer in the blocking layer, forming a slit passing through the stack, forming second openings by selectively removing the second material layers through the slit, selectively forming a protective layer on exposed surfaces of the first material layers, etching the blocking layer through the second openings, oxidizing the protective layer, and forming insulating layers in the second openings.


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