The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
May. 03, 2021
Applicant:
Integrated Dynamics Engineering Gmbh, Raunheim, DE;
Inventor:
Andreas Birkner, Jena, DE;
Assignee:
Integrated Dynamics Engineering GmbH, Raunheim, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 13/08 (2006.01); G06N 3/08 (2023.01); H05K 13/00 (2006.01);
U.S. Cl.
CPC ...
H05K 13/0818 (2018.08); G06N 3/08 (2013.01); H05K 13/0015 (2013.01); H05K 13/0812 (2018.08);
Abstract
A method for processing substrates, in particular wafers, masks or flat panel displays, with a semi-conductor industry machine, wherein a computer-supported process is used to determine the presence and/or position and/or orientation of the substrate. Further, a system designed to execute the method. The computer-supported process includes an artificial neural network.