The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Apr. 27, 2023
Applicant:

Samsung Display Co., Ltd., Yongin-Si, KR;

Inventors:

Hanbit Kim, Seoul, KR;

Sungwook Kim, Suwon-si, KR;

Chanyeob Seol, Suwon-si, KR;

Yunjung Oh, Anyang-si, KR;

Jeong-Soo Lee, Seoul, KR;

Jina Lee, Seongnam-si, KR;

Seongbaik Chu, Hwaseong-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G09G 3/3233 (2016.01); H10K 59/131 (2023.01);
U.S. Cl.
CPC ...
G09G 3/3233 (2013.01); H10K 59/131 (2023.02); G09G 2300/0426 (2013.01); G09G 2300/0819 (2013.01); G09G 2300/0842 (2013.01); G09G 2300/0861 (2013.01); G09G 2310/08 (2013.01); G09G 2320/0247 (2013.01);
Abstract

A pixel may include a light emitting diode which includes an anode and a cathode, a first transistor which includes a first source region, a first drain region electrically connected to the anode, a first channel region, and a first gate electrode, a first sub-transistor which includes a first sub-source region connected to the first drain region, a first sub-drain region, a first sub-channel region, and a first sub-gate electrode, a second sub-transistor which includes a second sub-source region connected to the first sub-drain region, a second sub-drain region connected to the first gate electrode, a second sub-channel region, and a second sub-gate electrode, a storage line which overlaps the first sub-drain region and the second sub-source region, and a first hold pattern which overlaps the first sub-drain region, the second sub-source region, and the storage line, and connected to the first sub-drain region and the second sub-source region.


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