The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
Dec. 10, 2021
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Min-Cheol Kang, Hwaseong-si, KR;
Dong Hoon Kuk, Seoul, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 5/70 (2024.01); G06T 7/13 (2017.01); G06T 7/30 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 5/70 (2024.01); G06T 7/13 (2017.01); G06T 7/30 (2017.01); G06T 2207/10061 (2013.01);
Abstract
A method of manufacturing a semiconductor device that includes providing a substrate having a pattern formed thereon. A scanning electron microscope (SEM) image is generated that includes a boundary image showing an edge of the pattern. A blended image is generated by performing at least one blending operation on the SEM image and a background image aligned with the boundary image. Contour data is generated by binarizing the blended image on a basis of a threshold value. The threshold value is determined by a critical dimension of the pattern.