The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Dec. 22, 2022
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Pinghai Yang, Niskayuna, NY (US);

Hongqing Sun, West Chester, OH (US);

Manuel Acosta, West Chester, OH (US);

Ruben E. Fairman, West Chester, OH (US);

Assignee:

GENERAL ELECTRIC COMPANY, Cincinnati, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01); G05B 13/04 (2006.01); B23K 26/342 (2014.01);
U.S. Cl.
CPC ...
G05B 19/41885 (2013.01); G05B 13/042 (2013.01); B23K 26/342 (2015.10); G05B 2219/40091 (2013.01); G05B 2219/49023 (2013.01);
Abstract

Methods and apparatus for two-dimensional and three-dimensional scanning path visualization are disclosed. An example apparatus includes at least one memory, instructions in the apparatus, and processor circuitry to execute the instructions to identify at least one melt pool dimension using a beam parameter setting, the at least one melt pool dimension identified from a plurality of melt pool dimensions obtained by varying the beam parameter setting, identify a response surface model based on the plurality of melt pool dimensions to determine an effect of variation in the beam parameter setting on the at least one melt pool dimension, output a three-dimensional model of a scanning path for an additive manufacturing process using the response surface model, and adjust the beam parameter setting based on the three-dimensional model to identify a second beam parameter setting.


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