The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
Jul. 16, 2021
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Fen Wan, Austin, TX (US);
Weijun Liu, Cedar Park, TX (US);
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/027 (2006.01); C08F 220/18 (2006.01); C08F 222/10 (2006.01); C08F 236/04 (2006.01); C08K 3/04 (2006.01); C08K 9/04 (2006.01); G03F 7/00 (2006.01); G03F 7/031 (2006.01); G03F 7/085 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C08F 220/1807 (2020.02); C08F 222/103 (2020.02); C08F 236/045 (2013.01); C08K 3/045 (2017.05); C08K 9/04 (2013.01); G03F 7/0002 (2013.01); G03F 7/031 (2013.01); G03F 7/085 (2013.01);
Abstract
A photocurable composition can comprise a polymerizable material, a fullerene or fullerene derivative in an amount of at least 0.2 wt % and not greater than 5.0 wt %, and a photoinitiator and may be adapted for AIP or NIL processing. A photo-cured layer made from the photocurable composition can have an improved thermal stability in comparison to a photo-cured layer made from the same photocurable composition except not containing a fullerene or fullerene derivative.