The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Apr. 15, 2021
Applicant:

Raytheon Company, Tewksbury, MA (US);

Inventors:

David J. Knapp, Tucson, AZ (US);

Gerald P. Uyeno, Tucson, AZ (US);

Sean D. Keller, Tucson, AZ (US);

Benn H. Gleason, Tucson, AZ (US);

Eric Rogala, Tucson, AZ (US);

Mark K. Lange, Tucson, AZ (US);

Garret A. Odom, Tucson, AZ (US);

Craig O. Shott, Benson, AZ (US);

Zachary D. Barker, Marana, AZ (US);

Assignee:

Raytheon Company, Tewksbury, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 26/10 (2006.01); B81B 3/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
G02B 26/105 (2013.01); B81B 3/0083 (2013.01); G02B 26/0833 (2013.01); B81B 2201/042 (2013.01); B81B 2203/058 (2013.01); B81B 2207/053 (2013.01);
Abstract

An optical scanning system includes one or more Micro-Electro-Mechanical System (MEMS) Micro-Mirror Arrays (MMAs) used to scan a field-of-view (FOV) over a field-of-regard (FOR). The MEMS MMA is configured such that optical radiation from each point in the FOV does not land on or originate from out-of-phase mirror segments and a diffraction limited resolution of the optical system is limited by the size of the entrance pupil and not by the size of individual mirrors.


Find Patent Forward Citations

Loading…