The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Apr. 11, 2022
Applicant:

Lennox Industries Inc., Richardson, TX (US);

Inventors:

Surendran Ramasamy, Chennai, IN;

Henry Greist, Gainesville, FL (US);

Sanjeev Hingorani, Gainesville, FL (US);

Calvin Michaelis, Carrollton, TX (US);

Assignee:

Lennox Industries Inc., Richardson, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/22 (2006.01); F24F 11/89 (2018.01); F24F 110/64 (2018.01); F24F 110/66 (2018.01); F24F 110/70 (2018.01);
U.S. Cl.
CPC ...
G01N 1/2247 (2013.01); F24F 11/89 (2018.01); G01N 1/2273 (2013.01); F24F 2110/64 (2018.01); F24F 2110/66 (2018.01); F24F 2110/70 (2018.01);
Abstract

An air quality measuring device that includes a first chamber, a second chamber, a third chamber, and a fourth chamber. The first chamber includes a first inlet configured to receive a first airflow, a first outlet configured to receive a first portion of the first airflow, and a second outlet configured to receive a second portion of the first airflow. The second chamber includes a second inlet configured to receive the first portion of the first airflow and a first sensor disposed within the second chamber. The third chamber includes a third inlet configured to receive the second portion of the first airflow and a second sensor disposed within the third chamber. The fourth chamber includes a fourth inlet configured to receive the second portion of the first airflow and a third sensor disposed within the fourth chamber.


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