The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Jun. 28, 2019
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventor:

Eiji Yoshikawa, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 9/00 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
G01L 9/0042 (2013.01); H01L 23/544 (2013.01);
Abstract

The present application provides a semiconductor pressure sensor having high manufacturing stability and high accuracy. A second silicon substrate is bonded across an oxide film to one main face of a first silicon substrate, in which a recessed portion that becomes a reference pressure chamber and an alignment mark are formed, whereby the first silicon substrate and the second silicon substrate are joined in a state wherein the recessed portion and the alignment mark are covered by the second silicon substrate. The alignment mark is detected using an infrared sensor, positioning is carried out using the alignment mark, and a gauge resistor, which is a pressure-sensitive element portion, is formed in a diaphragm formed in the second silicon substrate positioned above the recessed portion.


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