The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Aug. 31, 2020
Applicants:

Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Sen Du, Beijing, CN;

Jianpeng Wu, Beijing, CN;

Yuanqi Zhang, Beijing, CN;

Fengli Ji, Beijing, CN;

Qian Xu, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2006.01); C23C 14/04 (2006.01); H01L 31/0216 (2014.01); H01L 33/58 (2010.01); H10K 71/16 (2023.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/54 (2013.01); H01L 31/02162 (2013.01); H01L 33/58 (2013.01); H10K 71/166 (2023.02);
Abstract

A method for controlling stretching of a mask includes: obtaining actual position information of at least one opening of the mask; determining an actual offset of each opening according to actual position information of the opening and preset position information of a light-emitting region of a sub-pixel corresponding to the opening; determining whether the actual offset of the opening is less than or equal to a theoretical maximum offset of the opening; and in response to determining that the actual offset of the opening is less than or equal to the theoretical maximum offset of the opening, generating a first end command for ending a process of stretching the mask.


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