The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
Mar. 20, 2019
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Yoshihiro Kishimoto, Tokyo, JP;
Azusa Suzuki, Tokyo, JP;
Kanari Aono, Tokyo, JP;
Yasunari Iio, Tokyo, JP;
Shohei Itami, Tokyo, JP;
DAI NIPPON PRINTING CO., LTD., Tokyo, JP;
Abstract
Provided are: a laminate film which is equipped with a vapor-deposited aluminum oxide film exhibiting high barrier performance and excellent so-called retort resistance, and also exhibits favorable adhesion between the vapor-deposited aluminum oxide film and a plastic substrate even after undergoing a hydrothermal treatment; a barrier laminate film containing the laminate film; and a barrier packaging material which uses the barrier laminate film. A laminate film exhibiting improved adhesion strength and barrier performance, wherein: a transition region prescribing adhesion strength is formed between the surface of the substrate film and the vapor-deposited film which primarily comprises the formed vapor-deposited aluminum oxide film, by subjecting the vapor-deposited aluminum oxide film of the laminate film to a time-of-flight secondary ion mass spectrometry (TOF-SIMS) method using a Cs (cesium) ion gun; the transition region contains elementally bonded AlOH, which can be modified into aluminum hydroxide which can be detected by etching using TOF-SIMS; and the rate of modification in the transition region into aluminum hydroxide, which is defined as the ratio of the modified transition region to the vapor-deposited aluminum oxide film specified by carrying out etching using TOF-SIMS, is prescribed to be 5-60%, inclusive.