The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
Jun. 30, 2021
Wavelength conversion member manufacturing method and method for manufacturing light-emitting device
Applicant:
Nichia Corporation, Anan, JP;
Inventors:
Naoki Eboshi, Tokushima, JP;
Hiroaki Yuto, Awa, JP;
Assignee:
NICHIA CORPORATION, Anan, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/364 (2014.01); B23K 26/00 (2014.01); B23K 26/0622 (2014.01); B23K 26/08 (2014.01); B23K 26/359 (2014.01); B23K 26/402 (2014.01); F21K 9/64 (2016.01); F21K 9/90 (2016.01); B23K 101/36 (2006.01); B23K 103/00 (2006.01); F21Y 115/30 (2016.01);
U.S. Cl.
CPC ...
B23K 26/364 (2015.10); B23K 26/0006 (2013.01); B23K 26/0624 (2015.10); B23K 26/083 (2013.01); B23K 26/359 (2015.10); B23K 26/402 (2013.01); F21K 9/64 (2016.08); F21K 9/90 (2013.01); B23K 2101/36 (2018.08); B23K 2103/52 (2018.08); F21Y 2115/30 (2016.08);
Abstract
A wavelength conversion member manufacturing method includes: providing the wavelength conversion member having an upper surface, the wavelength conversion member including a phosphor portion, and a light-transmissive portion configured to transmit fluorescence from the phosphor portion; and forming, in the wavelength conversion member, at least one depressed portion each having an inclined surface inclined with respect to the upper surface by irradiating the wavelength conversion member with a pulsed laser beam from above more than once to form a plurality of continuous machining marks at different processing depths.