The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Feb. 08, 2021
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Yasuko Sone, Tokyo, JP;
Katsunari Obata, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
A manufacturing method of a deposition mask includes a resin-layer forming step of forming a resin layer on one surface of a substrate by applying a resin solution to the surface of the substrate, a step of forming a non-contact area, which is not in contact with the surface of the substrate in the resin layer, by removing at least a part of the substrate, a step of bringing the resin layer into contact with a liquid or heating the resin layer after the non-contact area has been formed in the resin layer, and a resin-layer processing step of forming an opening in the resin layer by processing the resin layer after the step of bringing the resin layer into contact with the liquid or heating the resin layer.