Vertical memory devices having support structures to replace dummy channels and methods of manufacturing the same

Abstract

A vertical memory device includes a gate electrode structure formed on a substrate including a cell array region and a pad region, a channel, contact plugs, and support structures. The gate electrode structure includes gate electrodes extending in a second direction and stacked in a staircase shape in a first direction on the pad region. The channel extends through the gate electrode structure on the cell array region. The contact plugs contact corresponding ones of steps, respectively, of the gate electrode structure. The support structures extend through the corresponding ones of the steps, respectively, and extend in the first direction on the pad region. The support structure includes a filling pattern and an etch stop pattern covering a sidewall and a bottom surface thereof. An upper surface of each of the support structures is higher than that of the channel.