The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Nov. 25, 2020
Applicant:
Lyra Acquisition Holdings Llc, New York, NY (US);
Inventors:
Roderick J. Loewen, Redwood City, CA (US);
Ronald D. Ruth, Stanford, CA (US);
Assignee:
Lyra Acquisition Holdings LLC, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/09 (2006.01);
U.S. Cl.
CPC ...
H01S 3/0903 (2013.01);
Abstract
A system including an electron beam source for providing an electron beam and at least one undulator system configured to produce free-electron laser (FEL) radiation is described. The undulator system includes undulators and at least one optical section between the undulators. The undulators are configured to induce the electron beam to microbunch and radiate coherently. The optical section(s) are configured to operate on the electron beam and the FEL radiation generated by the electron beam.