The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2024

Filed:

Sep. 06, 2019
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Yuichi Nagahisa, Tokyo, JP;

Shiro Hino, Tokyo, JP;

Koji Sadamatsu, Tokyo, JP;

Kotaro Kawahara, Tokyo, JP;

Hideyuki Hatta, Tokyo, JP;

Shingo Tomohisa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); H01L 29/45 (2006.01); H01L 29/739 (2006.01); H01L 29/872 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7393 (2013.01); H01L 29/1608 (2013.01); H01L 29/45 (2013.01); H01L 29/872 (2013.01);
Abstract

An object of the present invention is to suppress the passage of bipolar current in a silicon carbide semiconductor device by reducing a voltage applied to a terminal well region during reflux operations. An SiC-MOSFET includes a plurality of first well regions, a second well region, a third well region in a surface layer of a drift layer, the first, second, and third well regions being of a second conductivity type. The third well region is provided on the side of the second well region opposite to the first well regions. A unit cell that includes the first well regions includes a unipolar diode. The SiC-MOSFET includes a source electrode connected to the unipolar diode and the ohmic electrode and not having ohmic connection with the second well region and the third well region.


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