The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2024

Filed:

Jul. 03, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Rahul Rajeev, Sunnyvale, CA (US);

Yunzhe Yang, San Jose, CA (US);

Abhijit A. Kangude, San Jose, CA (US);

Kedar Joshi, Mountain View, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/50 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H01J 37/32899 (2013.01); H01J 2237/332 (2013.01);
Abstract

Exemplary semiconductor processing chambers may include a gasbox including a first plate having a first surface and a second surface opposite to the first surface. The first plate of the gasbox may define a central aperture that extends from the first surface to the second surface. The first plate may define an annular recess in the second surface. The first plate may define a plurality of apertures extending from the first surface to the annular recess in the second surface. The gasbox may include a second plate characterized by an annular shape. The second plate may be coupled with the first plate at the annular recess to define a first plenum within the first plate.


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