The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2024

Filed:

May. 28, 2021
Applicant:

Bank of America Corporation, Charlotte, NC (US);

Inventors:

Matthew Kristofer Bryant, Mount Holly, NC (US);

Colin Murphy, Charlotte, NC (US);

Dustin Stocks, Charlotte, NC (US);

Assignee:

Bank of America Corporation, Charlotte, NC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 16/23 (2019.01); G06F 16/215 (2019.01); G06F 16/28 (2019.01); G06N 20/00 (2019.01); G06F 16/21 (2019.01);
U.S. Cl.
CPC ...
G06F 16/2365 (2019.01); G06F 16/215 (2019.01); G06F 16/285 (2019.01); G06N 20/00 (2019.01);
Abstract

Aspects of the disclosure relate to data feed meta detail categorization for confidence. A computing platform may retrieve source data from a source system and identify a first set of patterns associated with the source data. The computing platform may retrieve, from a target system, partially transferred data associated with an ongoing data transfer from the source to the target system and identify a second set of patterns associated with the partially transferred data. The computing platform may evaluate integrity of the partially transferred data by comparing the first set of patterns with the second set of patterns. The computing platform may detect whether the first set of patterns falls within an expected deviation from the second set of patterns based on the comparison and halt the ongoing data transfer based on detecting that the first set of patterns falls outside the expected deviation from the second set of patterns.


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