The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Sep. 17, 2021
Harbin Institute of Technology, Harbin, CN;
HARBIN INSTITUTE OF TECHNOLOGY, Harbin, CN;
Abstract
The disclosure belongs to the technical field of precision test and measurement, and provides a two-dimensional photoelectric autocollimation method and device based on wavefront measurement and correction. According to the disclosure, a link of wavefront measurement and correction of a reference light path is added to a traditional autocollimator measuring method. By using wavefront distortion information of the reference light path in the instrument and driving a deformable mirror to compensate for phase distortion of a beam, the link realizes measurement and control on aberration of the optical system of the autocollimator and improves the imaging quality and spot positioning accuracy of the optical system, thereby improving the angle measurement accuracy of the autocollimator. At the same time, by introducing the link, the autocollimator has the ability to resist interference from the external environment, so that the resolution and stability of angle measurement of the autocollimator are further improved. The method makes the traditional autocollimator have a nano-radian order (5×10rad, that is 0.001″) angle resolution and a sub-microradian order (10rad, that is 0.02″) angle measurement accuracy. The disclosure has the technical advantage of realizing angle measurement with high resolution, high accuracy and high stability under the same conditions, and has the abilities to resist environmental disturbances and compensate for errors caused by the disturbances.