The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Apr. 27, 2023
Aeva, Inc., Mountain View, CA (US);
Cameron Howard, Bend, OR (US);
Sawyer Isaac Cohen, Menlo Park, CA (US);
Keith Gagne, Santa Clara, CA (US);
Bradley Scot Levin, San Jose, CA (US);
Pierre Hicks, San Francisco, CA (US);
Aeva, Inc., Mountain View, CA (US);
Abstract
A system and method receive a first beam pattern from an optical source that includes optical beams transmitted towards a target. The system and method measure a first vertical angle between at least two of the optical beams along a first axis relative to the FMCW LIDAR system. The system and method calculate a second beam pattern based on the first vertical angle and a pivot point. The second beam pattern produces a second vertical angle between the two optical beams. The system and method adjust one or more components from a first position that forms the first beam pattern to a second position that forms the second beam pattern for transmission towards the target. The system and method receive one or more return optical beams from the target, based on the second beam pattern, to produce a plurality of points to form the point cloud.