The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2024

Filed:

May. 20, 2021
Applicant:

Shimadzu Corporation, Kyoto, JP;

Inventors:

Tomotaka Nagashima, Kyoto, JP;

Yukimitsu Iwanaga, Kyoto, JP;

Norio Hirayama, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/16 (2006.01); G01N 3/08 (2006.01);
U.S. Cl.
CPC ...
G01B 11/168 (2013.01); G01N 3/08 (2013.01); G01N 2203/0017 (2013.01); G01N 2203/0647 (2013.01);
Abstract

A strain distribution measurement system includes a tensile tester that deforms a test piece to measure mechanical properties of a material of the test piece, and a strain distribution measuring device that measures a strain distribution of the test piece. The strain distribution measuring device measures the strain distribution of the test piece based on a distribution of at least one of a reflectance or a polarization characteristic on the main face of the test piece.


Find Patent Forward Citations

Nagashima, Tomotaka. (2024). Strain distribution measurement system and strain distribution measurement method that measure strain distribution based on distribution of reflectance or polarization characteristic (U.S. Patent No. 12055382). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12055382

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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